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INTERNATIONAL PATENT: TOKYO ELECTRON LIMITED, 東京エレクトロン株式会社 FILES APPLICATION FOR "SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT DEVICE"

GENEVA, April 28 -- TOKYO ELECTRON LIMITED (3-1, Akasaka 5-chome, Minato-ku, Tokyo1076325), 東京エレクトロン株式会社 (東&#... Read More


INTERNATIONAL PATENT: MITSUBISHI GAS CHEMICAL COMPANY, INC., 三菱瓦斯化学株式会社 FILES APPLICATION FOR "METHOD FOR PRODUCING POLYIMIDE RESIN"

GENEVA, April 28 -- MITSUBISHI GAS CHEMICAL COMPANY, INC. (5-2, Marunouchi 2-chome, Chiyoda-ku, Tokyo1008324), 三菱瓦斯化学株式会社 (&#26481... Read More


INTERNATIONAL PATENT: MITSUBISHI GAS CHEMICAL COMPANY, INC., 三菱瓦斯化学株式会社 FILES APPLICATION FOR "METHOD FOR PRODUCING POLYIMIDE RESIN"

GENEVA, April 28 -- MITSUBISHI GAS CHEMICAL COMPANY, INC. (5-2, Marunouchi 2-chome, Chiyoda-ku, Tokyo1008324), 三菱瓦斯化学株式会社 (&#26481... Read More


INTERNATIONAL PATENT: NIHON PARKERIZING CO.,LTD., 日本パーカライジング株式会社 FILES APPLICATION FOR "ALUMINUM-BASED METAL MATERIAL WITH CHEMICAL CONVERSION COATING FILM, CHEMICAL CONVERSION TREATMENT LIQUID FOR ALUMINUM-BASED METAL MATERIAL AND SURFACE TREATMENT METHOD FOR ALUMINUM-BASED METAL MATERIAL"

GENEVA, April 28 -- NIHON PARKERIZING CO.,LTD. (15-1,Nihonbashi 1-chome,Chuo-ku, Tokyo1030027), 日本パーカライジング株式会... Read More


INTERNATIONAL PATENT: NIPPON ELECTRIC GLASS CO., LTD., 日本電気硝子株式会社 FILES APPLICATION FOR "INORGANIC PLATE WITH FILM AND PACKAGE"

GENEVA, April 28 -- NIPPON ELECTRIC GLASS CO., LTD. (7-1, Seiran 2-chome, Otsu-shi, Shiga5208639), 日本電気硝子株式会社 (滋賀&#3... Read More


INTERNATIONAL PATENT: NSK LTD., 日本精工株式会社 FILES APPLICATION FOR "REDUCTION GEAR"

GENEVA, April 28 -- NSK LTD. (6-3, Ohsaki 1-chome, Shinagawa-ku, Tokyo1418560), 日本精工株式会社 (東京都品川区&#2282... Read More


INTERNATIONAL PATENT: SONY SEMICONDUCTOR SOLUTIONS CORPORATION, ソニーセミコンダクタソリューションズ株式会社 FILES APPLICATION FOR "IMAGE PROCESSING DEVICE, IMAGE PROCESSING METHOD AND IMAGE PROCESSING PROGRAM"

GENEVA, April 28 -- SONY SEMICONDUCTOR SOLUTIONS CORPORATION (4-14-1, Asahi-cho, Atsugi-shi, Kanagawa2430014), ソニーセミコンダクタソ&... Read More


INTERNATIONAL PATENT: HITACHI, LTD., 株式会社日立製作所 FILES APPLICATION FOR "SPACE GENERATION DEVICE, SPACE GENERATION METHOD AND SPACE GENERATION PROGRAM"

GENEVA, April 28 -- HITACHI, LTD. (6-6, Marunouchi 1-chome, Chiyoda-ku, Tokyo1008280), 株式会社日立製作所 (東京都千&#20195... Read More


INTERNATIONAL PATENT: SHIMADZU CORPORATION, 株式会社島津製作所 FILES APPLICATION FOR "DATA PROCESSING METHOD, ANALYSIS SYSTEM AND PROGRAM"

GENEVA, April 28 -- SHIMADZU CORPORATION (1, Nishinokyo Kuwabara-cho, Nakagyo-ku, Kyoto-shi, Kyoto6048511), 株式会社島津製作所 (京都&#... Read More


INTERNATIONAL PATENT: TOYO SEIKAN CO.,LTD., 東洋製罐株式会社 FILES APPLICATION FOR "POUCH FOR MICROWAVE OVENS AND FILLED POUCH FOR MICROWAVE OVENS"

GENEVA, April 28 -- TOYO SEIKAN CO.,LTD. (18-1, Higashi-Gotanda 2-chome, Shinagawa-ku, Tokyo1418640), 東洋製罐株式会社 (東京都品... Read More