Japan, Jan. 21 -- CANON INC has got intellectual property rights for 'COMMUNICATION DEVICE AND COMMUNICATION SYSTEM.' Other related details are as follows: Application Number: JP,2022-037792 Categor... Read More
Japan, Jan. 21 -- SUMITOMO HEAVY IND LTD has got intellectual property rights for 'CARBONATE ION CONCENTRATION DEVICE AND CARBONATE ION CONCENTRATION METHOD.' Other related details are as follows: Ap... Read More
Japan, Jan. 21 -- MITSUBISHI HEAVY IND LTD has got intellectual property rights for 'VIBRATION MEASURING DEVICE, VIBRATION MEASURING SYSTEM, VIBRATION MEASURING METHOD, AND PROGRAM.' Other related det... Read More
Japan, Jan. 21 -- SANEI LTD has got intellectual property rights for 'BRANCH METAL FITTING FOR FAUCET.' Other related details are as follows: Application Number: JP,2022-036252 Category (FI): F16L41... Read More
Japan, Jan. 21 -- MAZDA MOTOR CORP has got intellectual property rights for 'SIDE PART STRUCTURE OF MULTI-CYLINDER ENGINE.' Other related details are as follows: Application Number: JP,2022-035966 C... Read More
Japan, Jan. 21 -- MAZDA MOTOR CORP has got intellectual property rights for 'SIDE PART STRUCTURE OF MULTI-CYLINDER ENGINE.' Other related details are as follows: Application Number: JP,2022-035965 C... Read More
Japan, Jan. 21 -- MAZDA MOTOR CORP has got intellectual property rights for 'SIDE PART STRUCTURE OF MULTI-CYLINDER ENGINE.' Other related details are as follows: Application Number: JP,2022-035964 C... Read More
Japan, Jan. 21 -- MAZDA MOTOR CORP has got intellectual property rights for 'SIDE PART STRUCTURE OF MULTI-CYLINDER ENGINE.' Other related details are as follows: Application Number: JP,2022-035963 C... Read More
Japan, Jan. 21 -- TERUMO CORP has got intellectual property rights for 'DIALYSIS MANAGEMENT SYSTEM.' Other related details are as follows: Application Number: JP,2022-035835 Category (FI): G16H20/00... Read More
Japan, Jan. 21 -- FUJIMI INC has got intellectual property rights for 'POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE.' Other related details are as foll... Read More