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INTERNATIONAL PATENT: LG CHEM, LTD., 주식회사 엘지화학 FILES APPLICATION FOR "POLYLACTIDE RESIN COMPOSITION"

GENEVA, June 17 -- LG CHEM, LTD. (128, Yeoui-daero,Yeongdeungpo-gu,Seoul 07336), 주식회사 엘지화학 (서울특별시영&#46... Read More


INTERNATIONAL PATENT: LG CHEM, LTD., 주식회사 엘지화학 FILES APPLICATION FOR "METHOD FOR PREDICTING NECK-IN PROPERTY OF POLYLACTIDE RESIN"

GENEVA, June 17 -- LG CHEM, LTD. (128, Yeoui-daero,Yeongdeungpo-gu,Seoul 07336), 주식회사 엘지화학 (서울특별시영&#46... Read More


INTERNATIONAL PATENT: CHARM ENGINEERING CO.,LTD., 참엔지니어링(주) FILES APPLICATION FOR "PANEL REPAIRING APPARATUS"

GENEVA, June 17 -- CHARM ENGINEERING CO.,LTD. (5 Hyeongje-ro, Namsa-eup,Cheoin-gu, Yongin-siGyeonggi-do 17118), 참엔지니어링(주) (경기도&#50... Read More


INTERNATIONAL PATENT: SPEED FLOOR CO.,LTD, 주식회사 스피드플로어 FILES APPLICATION FOR "VARIABLE REFRIGERATION TOWER"

GENEVA, June 17 -- SPEED FLOOR CO.,LTD (910ho, 70, Songdogwahak-roYeonsu-guIncheon 21984), 주식회사 스피드플로어 (인천광&#... Read More


INTERNATIONAL PATENT: LX SEMICON CO., LTD., 주식회사 엘엑스세미콘 FILES APPLICATION FOR "IMAGE SENSOR"

GENEVA, June 17 -- LX SEMICON CO., LTD. (222, Techno 2-roYuseong-guDaejeon 34027), 주식회사 엘엑스세미콘 (대전광역&#... Read More


INTERNATIONAL PATENT: LX SEMICON CO.,LTD., 주식회사 엘엑스세미콘 FILES APPLICATION FOR "IMAGE SENSOR AND CONTROL METHOD THEREFOR"

GENEVA, June 17 -- LX SEMICON CO.,LTD. (222, Techno 2-ro, Yuseong-guDaejeon 34027), 주식회사 엘엑스세미콘 (대전광역&... Read More


INTERNATIONAL PATENT: LG ELECTRONICS INC., 엘지전자 주식회사 FILES APPLICATION FOR "RECIPROCATING COMPRESSOR"

GENEVA, June 17 -- LG ELECTRONICS INC. (128, Yeoui-daeroYeongdeungpo-guSeoul 07336), 엘지전자 주식회사 (서울특별시영... Read More


INTERNATIONAL PATENT: DENSO CORPORATION, 株式会社デンソー FILES APPLICATION FOR "ELECTRIC DEVICE"

GENEVA, June 17 -- DENSO CORPORATION (1-1, Showa-cho, Kariya-city Aichi4488661), 株式会社デンソー (愛知県刈谷市&#261... Read More


INTERNATIONAL PATENT: TS TECH CO., LTD., テイ・エス テック株式会社 FILES APPLICATION FOR "VEHICLE SEAT"

GENEVA, June 17 -- TS TECH CO., LTD. (3-7-27, Sakae-cho, Asaka-shi, Saitama3510012), テイ・エス テック株式会社 (埼&... Read More


INTERNATIONAL PATENT: RESONAC CORPORATION, 株式会社レゾナック FILES APPLICATION FOR "METHOD FOR FORMING INSULATING FILM AND PHOTOSENSITIVE RESIN COMPOSITION"

GENEVA, June 17 -- RESONAC CORPORATION (9-1, Higashi-Shimbashi 1-chome, Minato-ku, Tokyo1057325), 株式会社レゾナック (東京都&#28... Read More