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INTERNATIONAL PATENT: MITSUBISHI MATERIALS CORPORATION, 三菱マテリアル株式会社 FILES APPLICATION FOR "METHOD FOR PRODUCING SULFIDE-BASED SOLID ELECTROLYTE MATERIAL"

GENEVA, Dec. 16 -- MITSUBISHI MATERIALS CORPORATION (2-3, Marunouchi 3-chome, Chiyoda-ku, Tokyo1008117), 三菱マテリアル株式会社 (&#264... Read More


INTERNATIONAL PATENT: KAWASAKI JUKOGYO KABUSHIKI KAISHA, 川崎重工業株式会社 FILES APPLICATION FOR "ELECTROMAGNETIC RELIEF VALVE AND POPPET VALVE"

GENEVA, Dec. 16 -- KAWASAKI JUKOGYO KABUSHIKI KAISHA (1-1, Higashikawasaki-cho 3-chome, Chuo-ku, Kobe-shi, Hyogo6508670), 川崎重工業株式会社 (&#20... Read More


INTERNATIONAL PATENT: NIPRO CORPORATION, ニプロ株式会社 FILES APPLICATION FOR "PHENYLGLYOXYLIC ACID MEASUREMENT METHOD AND MEASUREMENT KIT TO BE USED THEREIN"

GENEVA, Dec. 16 -- NIPRO CORPORATION (3-26, Senriokashinmachi, Settsu-shi, Osaka5668510), ニプロ株式会社 (大阪府摂津市&#21... Read More


INTERNATIONAL PATENT: SHIN-ETSU CHEMICAL CO., LTD., 信越化学工業株式会社 FILES APPLICATION FOR "HYDROCARBON-TERMINAL-GROUP-CONTAINING COMPOUND, SURFACE TREATMENT AGENT, CURED FILM AND ARTICLE"

GENEVA, Dec. 16 -- SHIN-ETSU CHEMICAL CO., LTD. (4-1, Marunouchi 1-chome, Chiyoda-ku, Tokyo1000005), 信越化学工業株式会社 (東京&... Read More


INTERNATIONAL PATENT: IHI CORPORATION, 株式会社IHI FILES APPLICATION FOR "RECOVERY DEVICE"

GENEVA, Dec. 16 -- IHI CORPORATION (1-1, Toyosu 3-chome, Koto-ku, Tokyo1358710), 株式会社IHI (東京都江東区豊&#279... Read More


INTERNATIONAL PATENT: SHIMADZU CORPORATION, 株式会社島津製作所 FILES APPLICATION FOR "INDUSTRIAL FURNACE MANAGEMENT DEVICE, INDUSTRIAL FURNACE SYSTEM AND PROGRAM"

GENEVA, Dec. 16 -- SHIMADZU CORPORATION (1, Nishinokyo Kuwabara-cho, Nakagyo-ku, Kyoto-shi, Kyoto6048511), 株式会社島津製作所 (京都&#2... Read More


INTERNATIONAL PATENT: ASTEMO, LTD., ASTEMO株式会社 FILES APPLICATION FOR "SOFTWARE VERIFICATION SYSTEM AND SOFTWARE VERIFICATION METHOD"

GENEVA, Dec. 16 -- ASTEMO, LTD. (2-1, Otemachi 2-chome, Chiyoda-ku, Tokyo1000004), Astemo株式会社 (東京都千&#2... Read More


INTERNATIONAL PATENT: SONY SEMICONDUCTOR SOLUTIONS CORPORATION, ソニーセミコンダクタソリューションズ株式会社 FILES APPLICATION FOR "IMAGING ELEMENT AND IMAGING DEVICE"

GENEVA, Dec. 16 -- SONY SEMICONDUCTOR SOLUTIONS CORPORATION (4-14-1, Asahi-cho, Atsugi-shi, Kanagawa2430014), ソニーセミコンダクタソ&#... Read More


INTERNATIONAL PATENT: NIKON-ESSILOR CO.,LTD., 株式会社ニコン・エシロール FILES APPLICATION FOR "COMPOSITION AND EYEGLASS LENS"

GENEVA, Dec. 16 -- NIKON-ESSILOR CO.,LTD. (10-8, Ryogoku 2-chome, Sumida-ku, Tokyo1300026), 株式会社ニコン・エシロール (&#... Read More


INTERNATIONAL PATENT: JSR CORPORATION, JSR株式会社 FILES APPLICATION FOR "RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD AND ONIUM SALT COMPOUND"

GENEVA, Dec. 16 -- JSR CORPORATION (9-2, Higashi-Shinbashi 1-chome, Minato-ku, Tokyo1058640), JSR株式会社 (東京都港区東... Read More