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INTERNATIONAL PATENT: MITSUI HIGH-TEC, INC., 株式会社三井ハイテック FILES APPLICATION FOR "SUBSTRATE FOR SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING SAME AND SEMICONDUCTOR DEVICE"

GENEVA, Jan. 13 -- MITSUI HIGH-TEC, INC. (10-1, Komine 2-chome, Yahatanishi-ku, Kitakyushu-shi, Fukuoka8078588), 株式会社三井ハイテッ&#12463... Read More


INTERNATIONAL PATENT: MUZONRAK CORP., 無存楽株式会社 FILES APPLICATION FOR "METHOD, INFORMATION PROCESSING SYSTEM AND OBJECT RECOGNITION METHOD"

GENEVA, Jan. 13 -- MUZONRAK CORP. (YT Building 2F, 1-1, Wakaba, Shinjuku-ku, Tokyo1600011), 無存楽株式会社 (東京都新宿区&#... Read More


INTERNATIONAL PATENT: RESONAC CORPORATION, 株式会社レゾナック FILES APPLICATION FOR "LAMINATE, LAMINATED BOARD, PRINTED WIRING BOARD AND SEMICONDUCTOR PACKAGE"

GENEVA, Jan. 13 -- RESONAC CORPORATION (9-1, Higashi-Shimbashi 1-chome, Minato-ku, Tokyo1057325), 株式会社レゾナック (東京都&#28... Read More


INTERNATIONAL PATENT: ASAHI KASEI KABUSHIKI KAISHA, 旭化成株式会社 FILES APPLICATION FOR "AIRBAG BASE FABRIC AND AIRBAG AND METHODS FOR MANUFACTURING SAME"

GENEVA, Jan. 13 -- ASAHI KASEI KABUSHIKI KAISHA (1-1-2 Yurakucho, Chiyoda-ku, Tokyo1000006), 旭化成株式会社 (東京都千代田&... Read More


INTERNATIONAL PATENT: SHIN-ETSU CHEMICAL CO., LTD., 信越化学工業株式会社 FILES APPLICATION FOR "PRIMER COMPOSIITON AND ADHESION METHOD"

GENEVA, Jan. 13 -- SHIN-ETSU CHEMICAL CO., LTD. (4-1, Marunouchi 1-chome, Chiyoda-ku, Tokyo1000005), 信越化学工業株式会社 (東京&... Read More


INTERNATIONAL PATENT: DENKA COMPANY LIMITED, デンカ株式会社 FILES APPLICATION FOR "RESIN COMPOSITION, CURING METHOD THEREFOR AND CURED BODY"

GENEVA, Jan. 13 -- DENKA COMPANY LIMITED (1-1, Nihonbashi-Muromachi 2-chome, Chuo-ku, Tokyo1038338), デンカ株式会社 (東京都中央&... Read More


INTERNATIONAL PATENT: ICHIYAMA, MIKIO, 市山 幹雄 FILES APPLICATION FOR "AQUEOUS SECONDARY BATTERY"

GENEVA, Jan. 13 -- ICHIYAMA, Mikio (5-5-1-2815, Toyosu, Koto-ku, Tokyo1350061), 市山 幹雄 (東京都江東区豊洲5&#1996... Read More


INTERNATIONAL PATENT: TOPPAN HOLDINGS INC., TOPPANホールディングス株式会社 FILES APPLICATION FOR "METAL MASK AND INTERNAL ELECTRODE FOR MULTILAYER CERAMIC CAPACITOR"

GENEVA, Jan. 13 -- TOPPAN HOLDINGS INC. (5-1, Taito 1-chome, Taito-ku, Tokyo1100016), TOPPANホールディングス&#... Read More


INTERNATIONAL PATENT: DENKA COMPANY LIMITED, デンカ株式会社 FILES APPLICATION FOR "LOW DIELECTRIC HEAT DISSIPATION MATERIAL"

GENEVA, Jan. 13 -- DENKA COMPANY LIMITED (1-1, Nihonbashi-Muromachi 2-chome, Chuo-ku, Tokyo1038338), デンカ株式会社 (東京都中央&... Read More


INTERNATIONAL PATENT: CANON KABUSHIKI KAISHA, キヤノン株式会社 FILES APPLICATION FOR "DEVELOPMENT APPARATUS"

GENEVA, Jan. 13 -- CANON KABUSHIKI KAISHA (30-2, Shimomaruko 3-chome, Ohta-KuTokyo 1468501), キヤノン株式会社 (東京都大田&... Read More