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INTERNATIONAL PATENT: DAIKIN INDUSTRIES, LTD., ダイキン工業株式会社 FILES APPLICATION FOR "RUBBER MEMBER AND SEMICONDUCTOR MANUFACTURING-RELATED DEVICE"

GENEVA, Oct. 5 -- DAIKIN INDUSTRIES, LTD. (Osaka Umeda Twin Towers South, 1-13-1, Umeda, Kita-ku, Osaka-Shi, Osaka5300001), ダイキン工業株式会&#31... Read More


INTERNATIONAL PATENT: SHIBAURA MECHATRONICS CORPORATION, 芝浦メカトロニクス株式会社 FILES APPLICATION FOR "MOUNTING PRETREATMENT DEVICE, MOUNTING SYSTEM AND MOUNTING PRETREATMENT METHOD"

GENEVA, Oct. 5 -- SHIBAURA MECHATRONICS CORPORATION (5-1, Kasama 2-chome, Sakae-ku, Yokohama-shi, Kanagawa2478610), 芝浦メカトロニクス株&#24... Read More


INTERNATIONAL PATENT: SUMITOMO OSAKA CEMENT CO., LTD., 住友大阪セメント株式会社 FILES APPLICATION FOR "TEMPERATURE REGULATION MEMBER AND ELECTROSTATIC CHUCK DEVICE"

GENEVA, Oct. 5 -- SUMITOMO OSAKA CEMENT CO., LTD. (1-9-2 Higashi-Shimbashi, Minato-ku, Tokyo1058641), 住友大阪セメント株式会社 (... Read More


INTERNATIONAL PATENT: EDWARDS JAPAN LIMITED, エドワーズ株式会社, ADTEC PLASMA TECHNOLOGY CO.,LTD., 株式会社アドテックプラズマテクノロジー FILES APPLICATION FOR "VACUUM EVACUATION DEVICE"

GENEVA, Oct. 5 -- EDWARDS JAPAN LIMITED (1078-1, Yoshihashi, Yachiyo-shi Chiba2768523), エドワーズ株式会社 (千葉県八&#2131... Read More


INTERNATIONAL PATENT: KAWASAKI JUKOGYO KABUSHIKI KAISHA, 川崎重工業株式会社 FILES APPLICATION FOR "SURGERY ASSISTANCE SYSTEM, SURGERY ASSISTANCE METHOD AND INFORMATION PROVISION METHOD"

GENEVA, Oct. 5 -- KAWASAKI JUKOGYO KABUSHIKI KAISHA (1-1, Higashikawasaki-cho 3-chome, Chuo-ku, Kobe-shi, Hyogo6508670), 川崎重工業株式会社 (&#208... Read More


INTERNATIONAL PATENT: KANEKA CORPORATION, 株式会社カネカ FILES APPLICATION FOR "IPT-EXPRESSING NUCLEIC ACID CONSTRUCT"

GENEVA, Oct. 5 -- KANEKA CORPORATION (3-18, Nakanoshima 2-chome, Kita-ku, Osaka-shi, Osaka5308288), 株式会社カネカ (大阪府大阪&#... Read More


INTERNATIONAL PATENT: SQUARE ENIX CO.,LTD, 株式会社スクウェア・エニックス, SQUARE ENIX AI & ARTS ALCHEMY CO.,LTD, 株式会社スクウェア・エニックス・AI&アーツ・アルケミー FILES APPLICATION FOR "PROGRAM, INFORMATION PROCESSING METHOD AND COMPUTER DEVICE"

GENEVA, Oct. 5 -- SQUARE ENIX CO.,LTD (6-27-30, Shinjuku, Shinjuku-ku, Tokyo1608430), 株式会社スクウェア・エニック&#... Read More


INTERNATIONAL PATENT: FUJIFILM CORPORATION, 富士フイルム株式会社 FILES APPLICATION FOR "METHOD FOR DETECTING SUBSTANCE TO BE MEASURED, METHOD FOR REDUCING INFLUENCE OF HEMOLYSIS, COMPOSITION AND KIT FOR MEASURING SUBSTANCE TO BE MEASURED"

GENEVA, Oct. 5 -- FUJIFILM CORPORATION (26-30, Nishiazabu 2-chome, Minato-ku, Tokyo1068620), 富士フイルム株式会社 (東京都&... Read More


INTERNATIONAL PATENT: IDEMITSU KOSAN CO.,LTD., 出光興産株式会社 FILES APPLICATION FOR "THIN FILM, DEVICE AND METHOD FOR MANUFACTURING THIN FILM"

GENEVA, Oct. 5 -- IDEMITSU KOSAN CO.,LTD. (2-1, Otemachi 1-chome, Chiyoda-ku, Tokyo1008321), 出光興産株式会社 (東京都千代&... Read More


INTERNATIONAL PATENT: ZEON CORPORATION, 日本ゼオン株式会社 FILES APPLICATION FOR "COMPOSITION FOR DISPERSING CONDUCTIVE MATERIAL FOR ELECTROCHEMICAL ELEMENT, CONDUCTIVE MATERIAL DISPERSION LIQUID FOR ELECTROCHEMICAL ELEMENT, SLURRY COMPOSITION FOR ELECTROCHEMICAL ELEMENT ELECTRODE, ELECTRODE FOR ELECTROCHEMICAL ELEMENT AND ELECTROCHEMICAL ELEMENT"

GENEVA, Oct. 5 -- ZEON CORPORATION (6-2, Marunouchi 1-chome, Chiyoda-ku, Tokyo1008246), 日本ゼオン株式会社 (東京都千&#2019... Read More