US Patent Issued to Tokyo Electron on May 19 for "Substrate processing method" (Japanese Inventor)

ALEXANDRIA, Va., May 19 -- United States Patent no. 12,633,497, issued on May 19, was assigned to Tokyo Electron Ltd. (Tokyo). "Substrate processing method" was invented by Morihito Inagaki (Yamanash... Read More

US Patent Issued to Lam Research on May 19 for "Duty cycle control to achieve uniformity" (California Inventors)

ALEXANDRIA, Va., May 19 -- United States Patent no. 12,633,498, issued on May 19, was assigned to Lam Research Corp. (Fremont, Calif.). "Duty cycle control to achieve uniformity" was invented by Alex... Read More

US Patent Issued to Tokyo Electron on May 19 for "Plasma processing device and plasma processing method" (Japanese Inventors)

ALEXANDRIA, Va., May 19 -- United States Patent no. 12,633,499, issued on May 19, was assigned to Tokyo Electron Ltd. (Tokyo). "Plasma processing device and plasma processing method" was invented by ... Read More

US Patent Issued to SEMES on May 19 for "Method of treating substrate and apparatus for treating substrate" (South Korean Inventors)

ALEXANDRIA, Va., May 19 -- United States Patent no. 12,633,500, issued on May 19, was assigned to SEMES Co. LTD. (Cheonan-si, South Korea). "Method of treating substrate and apparatus for treating su... Read More

US Patent Issued to Applied Materials on May 19 for "Gas distribution assemblies for semiconductor devices" (California Inventors)

ALEXANDRIA, Va., May 19 -- United States Patent no. 12,633,501, issued on May 19, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Gas distribution assemblies for semiconductor devices"... Read More

US Patent Issued to OERLIKON SURFACE SOLUTIONS, PFAFFIKON on May 19 for "Arc-beam scanning for suppressing anode overgrowth in PICVD system" (Liechtensteiner Inventor)

ALEXANDRIA, Va., May 19 -- United States Patent no. 12,633,502, issued on May 19, was assigned to OERLIKON SURFACE SOLUTIONS AG, PFAFFIKON (Pfaffikon, Switzerland). "Arc-beam scanning for suppressing... Read More

US Patent Issued to Tokyo Electron on May 19 for "Plasma processing apparatus" (Japanese Inventor)

ALEXANDRIA, Va., May 19 -- United States Patent no. 12,633,503, issued on May 19, was assigned to Tokyo Electron Ltd. (Tokyo). "Plasma processing apparatus" was invented by Ryo Sasaki (Miyagi, Japan)... Read More

US Patent Issued to PSK on May 19 for "Substrate processing apparatus" (South Korean Inventor)

ALEXANDRIA, Va., May 19 -- United States Patent no. 12,633,504, issued on May 19, was assigned to PSK INC. (Hwaseong-si, South Korea). "Substrate processing apparatus" was invented by Kwang-Sung Yoo ... Read More

US Patent Issued to HORIBA STEC on May 19 for "Analysis device, analysis method, and analysis program" (Japanese Inventors)

ALEXANDRIA, Va., May 19 -- United States Patent no. 12,633,505, issued on May 19, was assigned to HORIBA STEC Co. LTD. (Kyoto, Japan). "Analysis device, analysis method, and analysis program" was inv... Read More

US Patent Issued to Ventiva on May 19 for "Heat transfer using ionic pumps" (California Inventors)

ALEXANDRIA, Va., May 19 -- United States Patent no. 12,633,506, issued on May 19, was assigned to Ventiva Inc. (Fremont, Calif.). "Heat transfer using ionic pumps" was invented by Rudy Vadillo (Gilro... Read More

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