US Patent Issued to ZHEJIANG UNIVERSITY on April 15 for "Paenibacillus strain capable of producing polysaccharides with after-sun repair effect and use thereof" (Chinese Inventors)

ALEXANDRIA, Va., June 5 -- United States Patent no. 12,274,778, issued on April 15, was assigned to ZHEJIANG UNIVERSITY (Hangzhou, China).

"Paenibacillus strain capable of producing polysaccharides with after-sun repair effect and use thereof" was invented by Wenwen Zhou (Hangzhou, China) and Yiqing Wang (Hangzhou, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention discloses a Paenibacillus strain capable of producing polysaccharides with an after-sun repair effect and use thereof. This strain is classified and named as Paenibacillus polymyxa PYQ1, preserved in China General Microbiological Culture Collection Center with a preservation number of CGMCC No. 16444. The present invention ...