US Patent Issued to YANGTZE DELTA REGION INSTITUTE (HUZHOU), UNIVERSITY OF ELECTRONIC SCIENCE AND TECHNOLOGY OF CHINA on March 25 for "Bimetallic perovskite loaded graphene-like carbon nitride visible-light photocatalyst and its preparation method" (Chinese Inventors)

ALEXANDRIA, Va., March 26 -- United States Patent no. 12,257,571, issued on March 25, was assigned to YANGTZE DELTA REGION INSTITUTE (HUZHOU), UNIVERSITY OF ELECTRONIC SCIENCE AND TECHNOLOGY OF CHINA (Huzhou, China).

"Bimetallic perovskite loaded graphene-like carbon nitride visible-light photocatalyst and its preparation method" was invented by Jianping Sheng (Huzhou, China), Ye He (Huzhou, China), Guo Zhang (Huzhou, China) and Fan Dong (Huzhou, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is a method for preparing a bimetallic perovskite loaded grapheme-like carbon nitride photocatalyst, comprising: 11) dissolving SbCl3 and AgCl in HCl solution under heating and constant stirring; then ad...