ALEXANDRIA, Va., Aug. 26 -- United States Patent no. 12,400,884, issued on Aug. 26, was assigned to WISTRON CORP. (New Taipei, Taiwan).
"Film removal apparatus and uncovering mechanism" was invented by Zeshan Yan (New Taipei, Taiwan), Shun-Chi Yeh (New Taipei, Taiwan), Fuhua Yan (New Taipei, Taiwan) and Chen Qin (New Taipei, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "This disclosure relates to a film removal apparatus that is suitable for uncovering a film of a semiconductor substrate and includes a carrier, an uncovering mechanism and a lifting mechanism. The carrier supports the semiconductor substrate. The uncovering mechanism includes a slider, a guider and a roller. The slider is slidably dis...