US Patent Issued to Versum Materials US on June 10 for "Photoresist remover" (Indiana, Arizona Inventors)

ALEXANDRIA, Va., June 18 -- United States Patent no. 12,325,844, issued on June 10, was assigned to Versum Materials US LLC (Tempe, Ariz.).

"Photoresist remover" was invented by Yuanmei Cao (Carmel, Ind.), Michael Phenis (Markleville, Ind.), Lili Wang (Chandler, Ariz.), Laisheng Sun (Gilbert, Ariz.) and Aiping Wu (Chandler, Ariz.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Cleaning compositions and the method of using the same are disclosed, where the compositions include one or more alkanolamines, one or more ether alcohol solvents or aromatic containing alcohol, one or more corrosion inhibitors, and optionally one or more secondary solvents."

The patent was filed on Sept. 28, 2020, under Application No...