US Patent Issued to UNIVERSITY PUBLIC CORPORATION OSAKA, NATIONAL UNIVERISTY CORPORATION HOKKAIDO UNIVERSITY, DAICEL on July 15 for "Particle discrimination mechanism" (Japanese Inventors)

ALEXANDRIA, Va., July 16 -- United States Patent no. 12,357,992, issued on July 15, was assigned to UNIVERSITY PUBLIC CORPORATION OSAKA (Osaka, Japan), NATIONAL UNIVERISTY CORPORATION HOKKAIDO UNIVERSITY (Hokkaido, Japan) and DAICEL Corp. (Osaka, Japan).

"Particle discrimination mechanism" was invented by Hajime Ishihara (Sakai, Japan), Takudo Wada (Sakai, Japan), Keiji Sasaki (Sapporo, Japan) and Yuto Makino (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A particle discrimination mechanism includes: a channel in which a plurality of first nanoparticles each including an absorber having a predetermined absorption level and a plurality of second nanoparticles each of which does not include the absorber...