US Patent Issued to UNIVERSITE PICARDIE JULES VERNE on Feb. 10 for "Process for direct deposition of graphene or graphene oxide onto a substrate of interest" (French Inventors)

ALEXANDRIA, Va., Feb. 11 -- United States Patent no. 12,545,996, issued on Feb. 10, was assigned to UNIVERSITE PICARDIE JULES VERNE (Amiens, France).

"Process for direct deposition of graphene or graphene oxide onto a substrate of interest" was invented by Mustapha Jouiad (Amiens, France), Mimoun El Marssi (Dury, France) and Michael Lejeune (Amiens, France).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention pertains to a process for direct deposition of graphene oxide onto a substrate of interest from a gaseous source of at least one carbon precursor, using a plasma-enhanced chemical vapor deposition method. It is also directed to a device for implementing this process."

The patent was file...