US Patent Issued to UNIVERSITE D'AIX-MARSEILLE, CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE, SORBONNE UNIVERSITE, UNIVERSITE PARIS-SACLAY on March 4 for "Nanoimprint lithography process and patterned substrate obtainable therefrom" (French, Italian Inventors)

ALEXANDRIA, Va., March 5 -- United States Patent no. 12,242,184, issued on March 4, was assigned to UNIVERSITE D'AIX-MARSEILLE (Marseilles, France), CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (Paris), SORBONNE UNIVERSITE (Paris) and UNIVERSITE PARIS-SACLAY (Gif-sur-Yvette, France).

"Nanoimprint lithography process and patterned substrate obtainable therefrom" was invented by David Grosso (Allauch, France), Marco Faustini (Paris), Olivier Dalstein (Paris), Andrea Cattoni (Rosate, Italy) and Thomas Bottein (Talence, France).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention pertains to the field of nanoimprint lithography (NIL) processes and more specifically to a soft NIL process used for p...