US Patent Issued to Tsinghua University, HON HAI PRECISION INDUSTRY on June 17 for "Infrared stealth cloth and infrared stealth clothes" (Chinese Inventors)

ALEXANDRIA, Va., June 19 -- United States Patent no. 12,330,944, issued on June 17, was assigned to Tsinghua University (Beijing) and HON HAI PRECISION INDUSTRY Co. LTD. (New Taipei, Taiwan).

"Infrared stealth cloth and infrared stealth clothes" was invented by Yuan-Hao Jin (Beijing), Qun-Qing Li (Beijing) and Shou-Shan Fan (Beijing).

According to the abstract* released by the U.S. Patent & Trademark Office: "An infrared stealth cloth includes a cloth substrate and an infrared light absorber located on the cloth substrate. The infrared light absorber includes a plurality of carbon nanotubes entangled with each other to form a network structure and a plurality of carbon particles in the network structure."

The patent was filed on March 29...