US Patent Issued to Tokyo Electron on Sept. 23 for "Plasma monitoring system, plasma monitoring method, and monitoring device" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 23 -- United States Patent no. 12,424,424, issued on Sept. 23, was assigned to Tokyo Electron Ltd. (Tokyo).

"Plasma monitoring system, plasma monitoring method, and monitoring device" was invented by Satoru Teruuchi (Miyagi, Japan), Jun Hirose (Miyagi, Japan), Kazuya Nagaseki (Miyagi, Japan) and Shinji Himori (Miyagi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma monitoring system includes a monitoring device and a control device. The monitoring device is a device to be placed on a stage in the plasma processing apparatus. The monitoring device includes a plate-shaped base substrate, and a plurality of spectroscopes having optical axes facing upward on the base substrat...