US Patent Issued to Tokyo Electron on Nov. 4 for "In-situ fluorescence-based chamber and wafer monitoring" (New York Inventors)

ALEXANDRIA, Va., Nov. 6 -- United States Patent no. 12,461,034, issued on Nov. 4, was assigned to Tokyo Electron Ltd. (Tokyo).

"In-situ fluorescence-based chamber and wafer monitoring" was invented by David Eitan Barlaz (Albany, N.Y.), Scott Lefevre (Albany, N.Y.), Joshua Larose (Albany, N.Y.) and Henry Puretz (Albany, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A system and a method directed to a monitoring system of semiconductor processing chambers is provided. In particular, monitoring of any chemical formation on a chamber and a wafer of a semiconductor processing chamber using in-situ laser induced fluorescence is provided. The monitoring system and method detect issues before they become a pro...