ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,453,152, issued on Oct. 21, was assigned to The United States of America as represented by the Secretary of the Army (Washington).
"Maskless patterning and control of graphene layers" was invented by Eugene S. Zakar (Bethesda, Md.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A maskless, patterned graphene film is produced through use of a tunable metal as a catalyst for graphene growth. The metal layer contains precisely defined textures that control the formation of the graphene film. Specifically, graphene growth can be controlled from F-LG (few layer graphene) down to 2-LG (2-layer graphene) and 1-LG (1-layer graphene). More than one texture can be...