US Patent Issued to THE TEXAS A&M UNIVERSITY SYSTEM, UT- BATTELLE, BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM on March 4 for "Amorphous silicon oxide, amorphous silicon oxynitride, and amorphous silicon nitride thin films and uses thereof" (Texas, Tennessee Inventors)

ALEXANDRIA, Va., March 5 -- United States Patent no. 12,239,765, issued on March 4, was assigned to THE TEXAS A&M UNIVERSITY SYSTEM (College Station, Texas), UT- BATTELLE LLC (Oak Ridge, Tenn.) and BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM (Austin, Texas).

"Amorphous silicon oxide, amorphous silicon oxynitride, and amorphous silicon nitride thin films and uses thereof" was invented by Venu Varanasi (Lewisville, Texas), Pranesh Aswath (Grapevine, Texas), Megen Maginot (Beeville, Texas) and Nickolay V. Lavrik (Knoxville, Tenn.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Amorphous SiOx (SiO2), SiONx, silicon nitride (Si3N4), surface treatments are provided, on both metal (titanium) and non-metal surfa...