ALEXANDRIA, Va., Nov. 6 -- United States Patent no. 12,460,295, issued on Nov. 4, was assigned to The Regents of the University of Colorado (Denver).
"Stability of refractory materials in high temperature steam" was invented by Alan W. Weimer (Niwot, Colo.), Amanda Hoskins (Superior, Colo.) and Charles Musgrave (Longmont, Colo.).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention relates, in part, to a discovery of a method for using atomic layer deposition (ALD) to improve the stability of refractory materials in high temperature steam, and compositions produced by the method."
The patent was filed on Sept. 12, 2023, under Application No. 18/367,022.
*For further information, including ima...