US Patent Issued to The Hong Kong Research Institute of Textiles and Apparel on Aug. 12 for "Method and integrated system for non-aqueous solvent medium (NASM) dyeing of multiple forms of synthetic, natural and blended textiles" (Chinese Inventors)

ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,385,183, issued on Aug. 12, was assigned to The Hong Kong Research Institute of Textiles and Apparel Ltd. (Hong Kong).

"Method and integrated system for non-aqueous solvent medium (NASM) dyeing of multiple forms of synthetic, natural and blended textiles" was invented by Edwin Yee Man Keh (Hong Kong), Lei Yao (Hong Kong), Alex Hok Chung Chan (Hong Kong), John Kin Ming Leung (Hong Kong), Jason Lap Hung Chan (Hong Kong) and Wendy Lee Ying Yu (Hong Kong).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method and an integrated system for dyeing synthetic, natural, and blended textiles in the form of fabrics, yarns, and garments are provided. The integrated ...