US Patent Issued to Taiwan Semiconductor Manufacturing on July 1 for "Treatment of spin on organic material to improve wet resistance" (Taiwanese Inventors)

ALEXANDRIA, Va., July 3 -- United States Patent no. 12,347,727, issued on July 1, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"Treatment of spin on organic material to improve wet resistance" was invented by Tzu-Yang Lin (Hsinchu, Taiwan), Chen-Yu Liu (Hsinchu, Taiwan), Cheng-Han Wu (Hsinchu, Taiwan) and Ching-Yu Chang (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure provides example embodiments relating to conductive features, such as metal contacts, vias, lines, etc., and methods for forming those conductive features. In an embodiment, portions of an adhesion layer, barrier layer and/or seed layer is protected by a layer of an organic...