US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on April 22 for "Cleaning apparatus for cleaning surface of photomask" (Taiwanese Inventors)

ALEXANDRIA, Va., June 6 -- United States Patent no. 12,282,264, issued on April 22, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY Ltd. (Hsin-Chu, Taiwan).

"Cleaning apparatus for cleaning surface of photomask" was invented by Ting-Hsien Ko (Tainan, Taiwan), Chih-Wei Wen (Tainan, Taiwan) and Chung-Hung Lin (Tainan, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A cleaning apparatus for cleaning a surface of a photomask includes a housing defining a chamber, a photomask holder disposed within the chamber, and a gas dispenser disposed within the chamber to direct gas toward the photomask holder. The gas dispenser has two or more gas dispensing outlets. A driver is coupled to at least one of ...