US Patent Issued to Shin-Etsu Polymer, Shin-Etsu Chemical, National University Corporation Saitama University on Sept. 16 for "Method of manufacturing diamond substrate" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 17 -- United States Patent no. 12,416,098, issued on Sept. 16, was assigned to Shin-Etsu Polymer Co. Ltd. (Tokyo), Shin-Etsu Chemical Co. Ltd. (Tokyo) and National University Corporation Saitama University (Saitama, Japan).

"Method of manufacturing diamond substrate" was invented by Junichi Ikeno (Saitama, Japan), Yohei Yamada (Saitama, Japan), Hideki Suzuki (Saitama, Japan), Rika Matsuo (Saitama, Japan) and Hitoshi Noguchi (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of manufacturing a diamond substrate includes: a step of placing a laser condensing unit 190 configured to condense laser light B so as to face an upper surface 10a of a block 10 of single crystal diamon...