US Patent Issued to SHIN-ETSU CHEMICAL on Sept. 30 for "Method for forming film, film-forming apparatus, and laminate" (Japanese Inventor)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,428,725, issued on Sept. 30, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo).

"Method for forming film, film-forming apparatus, and laminate" was invented by Hiroshi Hashigami (Annaka, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for forming a film, including: forming a film on a base body; and discharging a gas with a discharging unit. A channel plate is above and opposite to the base body via a space. A mixed gas flow linearly flows from a mixed gas supplying unit toward the discharging unit so that the mixed gas through the space above the base body is along at least part of a main surface of the base body. A projection is forme...