US Patent Issued to SHIN-ETSU CHEMICAL on Oct. 14 for "Polishing agent for synthetic quartz glass substrate, method for manufacturing the polishing agent, and method for polishing synthetic quartz glass substrate" (Japanese Inventor)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,440,939, issued on Oct. 14, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo).

"Polishing agent for synthetic quartz glass substrate, method for manufacturing the polishing agent, and method for polishing synthetic quartz glass substrate" was invented by Mitsuhito Takahashi (Annaka, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A polishing agent for a synthetic quartz glass substrate contains polishing particles and water. The polishing particles are composite oxide particles of cerium and yttrium. A content by percent of the cerium in the polishing particles is 71 mol % or more and 79 mol % or less. This provides a polishing agent for a synthe...