ALEXANDRIA, Va., Jan. 28 -- United States Patent no. D1,110,532, issued on Jan. 27, was assigned to Shenzhen Kaiyan Medical Equipment Co. Ltd. (Shenzhen, China).
"Phototherapy mask" was invented by Alain Dijkstra (Amstelveen, Netherlands), Li Xiang (Shenzhen, China) and Cao Jiaming (Shenzhen, China).
The patent was filed on March 8, 2024, under Application No. D/931,684.
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