ALEXANDRIA, Va., Feb. 11 -- United States Patent no. D1,112,782, issued on Feb. 10, was assigned to Shenzhen Kaiyan Medical Equipment Co. Ltd. (Shenzhen, China).
"Phototherapy mask" was invented by Alain Dijkstra (Amstelveen, Netherlands), Li Xiang (Shenzhen, China) and Huang Hong (Shenzhen, China).
The patent was filed on March 8, 2024, under Application No. D/931,688.
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