ALEXANDRIA, Va., Jan. 20 -- United States Patent no. 12,528,098, issued on Jan. 20, was assigned to Semes Co. Ltd. (Cheonan-si, South Korea).
"Apparatus for pressurizing photoresist and system for supplying photoresist" was invented by Hae Kyung Kim (Cheonan-si, South Korea), Dae Sung Kim (Cheonan-si, South Korea) and Woo Sin Jung (Cheonan-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a pressurizing apparatus that pressurizes a photoresist. In an embodiment, the pressurizing apparatus includes: a housing including a wall surface defining an internal space; a film separating the internal space into a first space and a second space; a first inlet which is in communication with the ...