ALEXANDRIA, Va., Jan. 28 -- United States Patent no. 12,538,731, issued on Jan. 27, was assigned to SCREEN Holdings Co. Ltd. (Kyoto, Japan).
"Batch substrate treatment apparatus" was invented by Mitsutoshi Sasaki (Kyoto, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "Substrates are immersed in a treatment fluid stored in a treatment chamber, and subjected to a surface treatment. A first lid and a second lid cover an upper opening of the treatment chamber. The first lid and the second lid each include sloped surfaces. At least a part of the first lid and the second lid is immersed in the treatment fluid. During the treatment on the substrates, a plurality of bubble supply pipes eject bubbles into the tr...