US Patent Issued to SAMSUNG ELECTRONICS on May 27 for "Correcting apparatus of extreme ultraviolet (EUV) photomask and correcting method of EUV photomask" (South Korean Inventors)

ALEXANDRIA, Va., June 17 -- United States Patent no. 12,313,979, issued on May 27, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Suwon-si, South Korea).

"Correcting apparatus of extreme ultraviolet (EUV) photomask and correcting method of EUV photomask" was invented by Sanguk Park (Hanam-si, South Korea), Yongwoo Kim (Suwon-si, South Korea), Jongju Park (Hwaseong-si, South Korea), Youngchang Seo (Hwaseong-si, South Korea) and Jongkeun Oh (Seoul, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A correcting apparatus of an extreme ultraviolet (EUV) photomask includes: a support portion configured to support an EUV photomask having a main area in which a plurality of pattern elements are arranged, a ...