US Patent Issued to SAMSUNG ELECTRONICS on April 15 for "Photoresist inspection apparatus, photoresist inspection method using the same, and electron beam exposure apparatus" (Belgian, South Korean Inventors)

ALEXANDRIA, Va., June 5 -- United States Patent no. 12,276,907, issued on April 15, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).

"Photoresist inspection apparatus, photoresist inspection method using the same, and electron beam exposure apparatus" was invented by Sukjong Bae (Seoul, South Korea), Johan Hofkens (Leuven, Belgium), Haifeng Yuan (Leuven, Belgium) and Flip de Jong (Leuven, Belgium).

According to the abstract* released by the U.S. Patent & Trademark Office: "According to example embodiments, there is provided a photoresist inspection method. The photoresist inspection method includes: providing a photoresist on a substrate; irradiating the photoresist with an electron beam and an excitation beam; detect...