US Patent Issued to SAMSUNG ELECTRO-MECHANICS on Jan. 13 for "Method of reducing size of dielectric particles in dielectric slurry" (South Korean Inventors)

ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,525,398, issued on Jan. 13, was assigned to SAMSUNG ELECTRO-MECHANICS Co. LTD. (Suwon-si, South Korea).

"Method of reducing size of dielectric particles in dielectric slurry" was invented by Jung Jin Park (Suwon-si, South Korea), Su Min Kim (Suwon-si, South Korea), Ho Sam Choi (Suwon-si, South Korea), Kyu Jeong Sim (Suwon-si, South Korea), Jeong Ha Yoon (Suwon-si, South Korea) and Jong Ho Lee (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of manufacturing a dielectric slurry, includes supplying a dielectric slurry including dielectric particles and a solvent to a slurry supply module, dispersing the dielectric slurry by i...