US Patent Issued to Ricoh on Dec. 30 for "Liquid composition set, porous resin manufacturing apparatus, and porous resin manufacturing method" (Japanese Inventors)

ALEXANDRIA, Va., Dec. 31 -- United States Patent no. 12,509,567, issued on Dec. 30, was assigned to Ricoh Co. Ltd. (Tokyo).

"Liquid composition set, porous resin manufacturing apparatus, and porous resin manufacturing method" was invented by Naoki Sugihara (Kanagawa, Japan), Keigo Takauji (Kanagawa, Japan), Daisuke Nose (Kanagawa, Japan), Miku Ohkimoto (Kanagawa, Japan) and Toru Ushirogochi (Kanagawa, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A liquid composition set is provided. The liquid composition set comprises: a liquid composition X comprising a polymerizable compound X and a solvent X; and a liquid composition Y comprising a solvent Y. The liquid composition X is to form a porous resin, an...