US Patent Issued to Renaissance Energy Research, National Institute Of Technology on July 1 for "Method for synthesizing SiO 2 Al 2 O 3 containing sol solution and method for forming porous alumina film" (Japanese Inventors)

ALEXANDRIA, Va., July 3 -- United States Patent no. 12,343,703, issued on July 1, was assigned to Renaissance Energy Research Corp. (Kyoto, Japan) and National Institute Of Technology (Tokyo).

"Method for synthesizing SiO 2 Al 2 O 3 containing sol solution and method for forming porous alumina film" was invented by Akira Hasegawa (Aomori, Japan), Osamu Okada (Kyoto, Japan), Hiromi Nakamura (Kyoto, Japan) and Shizuka Ogasawara (Kyoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for synthesizing a sol solution for forming porous alumina films having high heat resistance and high specific surface area and excellent adhesion to various substrate surfaces is provided. The method can include prep...