ALEXANDRIA, Va., Aug. 20 -- United States Patent no. 12,396,291, issued on Aug. 19, was assigned to POSCO Co. LTD (Pohang-si, South Korea).
"Method for manufacturing porous polysiloxane film, porous polysiloxane film manufactured thereby, and solar cell module comprising same" was invented by Sung-Ju Tark (Pohang-Si, South Korea), Im-Soo Mok (Gumi-si, South Korea), Ji-Sang Park (Seoul, South Korea), Kun-Hoon Baek (Seoul, South Korea) and A-Rong Kim (Pohang-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "The purpose of the present invention is to provide a method for manufacturing a solar cell module, comprising the steps of: placing a mixture solution comprising a polysiloxane and a curing age...