ALEXANDRIA, Va., Nov. 11 -- United States Patent no. 12,466,914, issued on Nov. 11, was assigned to OSAKA GAS CHEMICALS Co. LTD. (Osaka, Japan).
"Retardation film and applications thereof" was invented by Yoshiya Ota (Osaka, Japan), Shinichi Kamei (Osaka, Japan) and Nagayoshi Masuda (Osaka, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A retardation film includes a polyester-series resin exhibiting a negative orientation birefringence and a forward wavelength dispersibility in retardation in combination with a polyamide-series resin exhibiting a positive orientation birefringence and a flat dispersibility in retardation. The polyester-series resin may contain a constitutional unit having a fluorene-9,...