ALEXANDRIA, Va., Feb. 26 -- United States Patent no. 12,235,091, issued on Feb. 25, was assigned to Onto Innovation Inc. (Wilmington, Mass.).
"Apparatus to characterize substrates and films" was invented by Jian Ding (Methuen, Mass.), Nathan Unruh (Hillsboro, Ore.), Ju Jin (Edina, Minn.) and Nazar Orishchin (Savage, Minn.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Various examples include an apparatus to characterize substrate and film thicknesses of the substrate and films formed thereon. The apparatus uses one or more wavelengths of light from a light source (e.g., a swept laser) to interrogate the substrate. The light is directed substantially orthogonally to an upper surface of the substrate. A polar...