US Patent Issued to NOF on Feb. 10 for "Antifoggant composition and anti-fog article having antifogging film formed from said composition" (Japanese Inventors)

ALEXANDRIA, Va., Feb. 11 -- United States Patent no. 12,545,790, issued on Feb. 10, was assigned to NOF Corp. (Tokyo).

"Antifoggant composition and anti-fog article having antifogging film formed from said composition" was invented by Hiroki Matsutani (Chita-gun, Japan) and Takamitsu Kano (Chita-gun, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An antifoggant composition including a copolymer (A), a blocked polyisocyanate hardener (B), colloidal silica (C), a surfactant (D), and water (E), wherein the copolymer (A) is a (meth)acrylate copolymer obtained from a monomer mixture comprising monomer (a-1) represented by general formula (1), monomer (a-2) represented by general formula (2), and monomer (a-...