ALEXANDRIA, Va., Sept. 23 -- United States Patent no. 12,424,441, issued on Sept. 23, was assigned to NISSAN CHEMICAL Corp. (Tokyo).
"Chemical-resistant protective film" was invented by Yuto Hashimoto (Toyama, Japan), Tokio Nishita (Toyama, Japan) and Yuki Endo (Toyama, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A protective film-forming composition excelling in preservation stability and having a favorable masking (protection) function against wet etching solutions when processing a semiconductor substrate, a protective film manufactured by using the composition, a substrate with a resist pattern, and a method for manufacturing a semiconductor device. The protective film-forming composition provid...