US Patent Issued to NISSAN CHEMICAL on July 22 for "Composition containing a heterocyclic compound having a dicyanostyryl group, for forming a resist underlayer film capable of being wet etched" (Japanese Inventors)

ALEXANDRIA, Va., July 23 -- United States Patent no. 12,366,804, issued on July 22, was assigned to NISSAN CHEMICAL Corp. (Tokyo).

"Composition containing a heterocyclic compound having a dicyanostyryl group, for forming a resist underlayer film capable of being wet etched" was invented by Takafumi Endo (Toyama, Japan) and Yuki Endo (Toyama, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A resist underlayer film, which, while exhibiting excellent resistance to a resist developer which is a resist solvent or an alkaline aqueous solution, exhibits removability, and preferably solubility, only in wet etching chemicals. This composition for forming a resist underlayer film contains a solvent, a heterocycli...