US Patent Issued to NISSAN CHEMICAL INDUSTRIES on March 4 for "Resist underlayer film-forming composition containing indolocarbazole novolak resin" (Japanese Inventors)

ALEXANDRIA, Va., March 5 -- United States Patent no. 12,242,196, issued on March 4, was assigned to NISSAN CHEMICAL INDUSTRIES LTD. (Tokyo).

"Resist underlayer film-forming composition containing indolocarbazole novolak resin" was invented by Hikaru Tokunaga (Toyama, Japan), Daigo Saito (Toyama, Japan), Keisuke Hashimoto (Toyama, Japan) and Rikimaru Sakamoto (Toyama, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A resist underlayer film for lithography does not cause intermixing with a resist layer, has high dry etching resistance and high heat resistance, and generates a low amount of sublimate. A resist underlayer film-forming composition containing a polymer having a unit structure of the following...