US Patent Issued to NATIONAL UNIVERSITY CORPORATION HOKKAIDO UNIVERSITY, NISSAN CHEMICAL on March 4 for "Liquid for nitriding treatment, nitrided metal oxide manufacturing method, and nitrided indium oxide film" (Japanese Inventors)

ALEXANDRIA, Va., March 5 -- United States Patent no. 12,240,754, issued on March 4, was assigned to NATIONAL UNIVERSITY CORPORATION HOKKAIDO UNIVERSITY (Sapporo, Japan) and NISSAN CHEMICAL Corp. (Sapporo, Japan).

"Liquid for nitriding treatment, nitrided metal oxide manufacturing method, and nitrided indium oxide film" was invented by Kiyoharu Tadanaga (Sapporo, Japan), Akira Miura (Sapporo, Japan), Tadayuki Isaji (Funabashi, Japan) and Shinichi Maeda (Funabashi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An alkali metal amide is dissolved in a cyclic alkylene urea represented by the formula (1) (wherein each of R1 and R2 represents a C1 to C3 alkyl group, and R3 represents a C1 to C4 alkylene grou...