US Patent Issued to National Institute of Advanced Industrial Science and Technology, Mitsubishi Gas Chemical Trading on July 8 for "Antireflection structure and manufacturing method thereof" (Japanese Inventors)

ALEXANDRIA, Va., July 9 -- United States Patent no. 12,352,927, issued on July 8, was assigned to National Institute of Advanced Industrial Science and Technology (Tokyo) and Mitsubishi Gas Chemical Trading Inc. (Tokyo).

"Antireflection structure and manufacturing method thereof" was invented by Kazuma Kurihara (Ibaraki, Japan), Ryohei Hokari (Ibaraki, Japan) and Hiroaki Fukui (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "An antireflection structure comprising a transparent substrate having a plurality of holes with U-shaped or V-shaped cross-sectional shapes perpendicular to a flat surface portion and a metal oxide film disposed on the surface portion of the transparent substrate and in the space po...