ALEXANDRIA, Va., June 18 -- United States Patent no. 12,327,686, issued on June 10, was assigned to MURATA MANUFACTURING Co. LTD. (Nagaokakyo, Japan).
"Film capacitor and film for film capacitor" was invented by Tomoki Inakura (Nagaokakyo, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A film capacitor that includes a dielectric resin film having a first surface and a second surface facing each other in a thickness direction of the dielectric resin film, wherein the first surface of the dielectric resin film includes 25 to 125 of first recesses each having a long diameter of 30 nm to 800 nm per an area of 5 micro metrex5 micro metre; and a metal layer on the first surface of the dielectric resin film."...