US Patent Issued to MITSUI CHEMICALS, NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY on April 29 for "Pellicle film for photolithography, pellicle, photolithography mask, photolithography system, and method of producing pellicle film for photolithography" (Japanese Inventors)

ALEXANDRIA, Va., June 9 -- United States Patent no. 12,287,569, issued on April 29, was assigned to MITSUI CHEMICALS INC. (Tokyo) and NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (Tokyo).

"Pellicle film for photolithography, pellicle, photolithography mask, photolithography system, and method of producing pellicle film for photolithography" was invented by Yousuke Ono (Sodegaura, Japan), Hisako Ishikawa (Ichihara, Japan), Ryohei Ogawa (Ichihara, Japan), Atsushi Okubo (Tokyo), Kazuo Kohmura (Iwakuni, Japan), Atsuko Sekiguchi (Tsukuba, Japan), Yuichi Kato (Tsukuba, Japan), Takeo Yamada (Tsukuba, Japan) and Ying Zhou (Tsukuba, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A pellicle f...