US Patent Issued to MITSUBISHI GAS CHEMICAL, Mitsubishi Gas Chemical Trading on May 20 for "Etching liquid for titanium and/or titanium alloy, method for etching titanium and/or titanium alloy with use of said etching liquid, and method for producing substrate with use of said etching liquid" (Japanese Inventors)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,308,249, issued on May 20, was assigned to MITSUBISHI GAS CHEMICAL COMPANY INC. (Chiyoda-ku, Japan) and Mitsubishi Gas Chemical Trading Inc. (Chiyoda-ku, Japan).

"Etching liquid for titanium and/or titanium alloy, method for etching titanium and/or titanium alloy with use of said etching liquid, and method for producing substrate with use of said etching liquid" was invented by Yukihide Naito (Tokyo), Hiroshi Matsunaga (Kanagawa, Japan) and Satoshi Tamai (Kanagawa, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An etching method for quickly removing a seed layer that is formed of titanium and/or a titanium alloy, while suppressing dissolution of o...