US Patent Issued to Merck Patent on June 3 for "Enhanced directed self-assembly in the presence of low T g oligomers for pattern formation" (Pennsylvania, New Jersey Inventors)

ALEXANDRIA, Va., June 4 -- United States Patent no. 12,319,810, issued on June 3, was assigned to Merck Patent GmbH (Darmstadt, Germany).

"Enhanced directed self-assembly in the presence of low T g oligomers for pattern formation" was invented by Durairaj Baskaran (Bridgewater, N.J.) and Victor Monreal (Breinigsville, Pa.).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention relates to a composition comprising components a), b) and c). The component a) is a block copolymer or a blend of block copolymers. The component b) is a low Tg additive selected from the group consisting of an oligo random oligo random copolymer b-1), an oligo diblock copolymer b-2), an oligo diblock copolymer b-3) and a ...