ALEXANDRIA, Va., June 5 -- United States Patent no. 12,276,909, issued on April 15, was assigned to Merck Patent GmbH (Darmstadt, Germany).
"Novolak/DNQ based, chemically amplified photoresist" was invented by Medhat A. Toukhy (Flemington, N.J.), Weihong Liu (Branchburg, N.J.), Takanori Kudo (Bedminster, N.J.), Hung-Yang Chen (Somerset, N.J.) and Jian Yin (Bridgewater, N.J.).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention relates to resist compositions comprising a polymer component, a photoacid generator component (PAG), a photoactive diazonaphthoquinone component (PAC), a base component, a solvent component, and optionally, a heterocyclic thiol component. The polymer component is a Novo...