ALEXANDRIA, Va., June 10 -- United States Patent no. 12,294,076, issued on May 6, was assigned to Massachusetts Institute of Technology (Cambridge, Mass.).

"Electrochemical formation of substrate coatings" was invented by Betar Gallant (Cambridge, Mass.) and Haining Gao (Cambridge, Mass.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Systems, articles, and methods generally related to the electrochemical formation of layers comprising halogen ions on substrates are described."

The patent was filed on Aug. 28, 2023, under Application No. 18/457,214.

*For further information, including images, charts and tables, please visit: http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml...